Example 5: UHV System for High Tc Superconductors

This system is a customised multi-chamber UHV system with ARPES, dedicated for the preparation and investigation of high Tc superconductors.

UHV System for High Tc Superconductors

This system is a customised multi-chamber UHV system with ARPES, dedicated for the preparation and investigation of high Tc superconductors.

High Tc Superconductors UHV System




UHV System Description

ARPES System is a customised multi-chamber UHV system dedicated for investigation of physical properties (electronic band structure) of high temperature superconductors - University Fudan, China.


High Tc Superconductors UHV System ARPES


Specification
Multi-chamber system designed around a central radial distribution chamber with attached analytical chamber and auxiliary chambers that fulfills the demands of a transport of samples under true UHV conditions (pressure <1E-10 mbar). The base pressure in the analytical chambers is < 5E-11 mbar.



  • Multi technique analytical chamber integrates different surface analysis methods; Monochromatic UV Photoelectron Spectroscopy (UPS) and LEED.
  • Sample positioning is via a stable, high precision, 5 axis manipulator with all axes motorised for automatic surface mapping.
  • The sample receiving station is equipped with a closed cycle helium cryostat that allows temperature variation over the range 10K to 400K.
  • The Chamber is fabricated from mu-metal and designed for energy resolution better then 0.5 meV, being equipped with a hemispherical analyser with 2D detector, monochromatic UV source and a LEED system. The flexible design allows for easy modification to meet future scientific demands.
  • The system is designed so that it can be used in the laboratory as well as on a synchrotron beam line. The analyser is mounted horizontally and can be easily rotated by 90 degrees. The frame has easy height and x-y adjustment for quick and easily reproduced alignment to an external light source (synchrotron or LASER).
  • Single level preparation chamber equipped with ion source and mass spectrometer and several ports which can be used in future for other preparation devices.
  • Load lock chamber for loading up to six samples and internal bakeout facility.
  • Sample park chamber for 6 sample holders.


UHV Surface Analysis
Our 16 page catalogue provides additional examples and is available for download here.




 
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