Example 4: UHV Epitaxial Multilayer Interfaces & Imaging XPS

This system is a customised multi-chamber UHV system dedicated for the preparation and investigation of multilayer interfaces.

UHV System for Multilayer Interfaces

This system is a customised multi-chamber UHV system (extended Kratos Axis Ultra) dedicated for the preparation and investigation of multilayer interfaces.

Multilayer Interface XPS UHV System Modules



UHV System Description

Customised multi-chamber UHV system dedicated for analysis of atomic and electronic surface structure, investigation and preparation of complex epitaxial metallic or molecular films on surfaces, as well as chemical analysis of interfaces in multilayer film samples. Installed at the MPI für Festkörperforschung in Stuttgart.


Multilayer Interface XPS UHV System


Specification
Multi-chamber system designed around a central radial distribution chamber with attached analytical chambers and auxiliary chambers that fulfills the demands of sample transport under true UHV conditions (pressure lower than 1E-10 mbar). The base pressure in the analytical chambers is < 5E-11 mbar. The central radial distribution chamber is connected to a second distribution chamber with the same design via a re-orientation chamber. The second system provides a connection to a commercial high performance XPS system (Kratos Axis Ultra) and access to a second preparation chamber, load-lock and sample storage chamber.



  • Multi technique analytical chamber integrates different surface analysis methods; X-ray Photoelectron Spectroscopy (XPS), Monochromatic Ultraviolet Photoelectron Spectroscopy (UPS), Ion Scattering Spectroscopy (ISS) and Auger Electron Spectroscopy (AES).
  • Sample positioning is via a stable, high precision, 5 axis manipulator with two rotational axes motorised. The sample receiving station is equipped with a LN2 cryostat that allows temperature variation over the range -180°C to 1000°C.
  • The chamber is made from mu-metal and is equipped with a hemispherical analyser, an X-ray source, a UV source with monochromator, an electron source and a flood gun. The flexible design allows easy modification according to future scientific demands.
  • The 5 axis manipulator and dedicated software allow the measurement of X-ray photoelectron diffraction data (XPD) with an angular resolution and repeatability of better then 0.1 degree.
  • Chamber for Infrared Spectroscopy (FT-IR) with commercial IR spectrometer that can be used also in a standalone application. The sample can be heated and cooled during the measurement and the chamber can be equipped with leak valve and electron beam evaporator for in-situ sample preparation.
  • Three level preparation chamber, equipped with LEED, ion source, electron beam evaporator, Knudsen cells, and many ports which can be used in future for preparation or evaporation devices.
  • Sample park chamber for 6 sample holders.
  • Load lock chamber prepared with detachable glove box for either simple sample loading or sample preparation under reduced oxygen and water atmosphere.

UHV Surface Analysis
Our 16 page catalogue provides additional examples and is available for download here.




 
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