Example 1: UHV System for Catalysis (A)

This system is a customised multi-chamber UHV system dedicated for the investigation of physical and chemical properties of catalyst surfaces

Multi-Technique UHV System for Catalysis

This system is a customised multi-chamber UHV system dedicated for the investigation of physical and chemical properties of catalyst surfaces.

Catalysis UHV System

UHV System Description

Multi-chamber system with linear sample transport with attached analytical chamber and preparation chamber to fulfill the demands of sample transport under true UHV conditions (pressure lower than 1E-10 mbar). The base pressure in the analytical chambers is < 5E-11 mbar. Catalytic reactions can be performed in the high pressure chamber up to 2 bar with quick pump down and transfer to the analysis chamber. Installed at Dept. Physics, NTNU, Trondheim.


UHV System for Catalyst Research


UHV System Specifications

  • Spherical multi technique analytical chamber integrates different surface analysis methods including Monochromatic X-Ray Photoelectron Spectroscopy (MXPS), Monochromatic Ultraviolet Photoelectron Spectroscopy (UPS) and Photoelectron Emission Microscopy (PEEM).
  • Sample positioning is via a very stable, high precision, 5-axis manipulator with two rotational axes motorized for automatic angular mapping. The sample receiving station is equipped with a LN2 cryostat that allows temperature variation over the range -180°C to 1000°C.
  • The chamber is fabricated from mu-metal and equipped with a hemispherical analyser with 2D detector,  a monochromatic x-ray source, UV source and monochromator, and a 40 nm resolution PEEM.
  • Pumping system with combination of maglev turbo molecular pumps, ion pumps and titanium sublimation pumps.
  • Surface analytical chamber and preparation chambers can be baked separately. The hemispherical analyser is mounted in a horizontal position.
  • Spherical preparation chamber mounted on top of the analysis chamber equipped with ion source, mass spectrometer, electron beam evaporator, gas doser and several ports which can be used in future for other preparation devices.
  • High pressure reactor for heating up to 650°C and cooling of the sample in controlled gas atmospheres under pressure up to 2 bar.
  • Sample park chamber for 6 sample holders.
  • Load lock chamber.


UHV Surface Analysis
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