Residual Gas Analyzers for Vacuum Processing

MKS Process Residual Gas Analyzers are innovative in-situ process monitoring instruments that are fully integrated and field proven application-specific packages.

The range includes the latest smart head technology delivering real-time on line analysis for vacuum diagnostics and process control in etching, thin film deposition (PVD and CVD) and plasma modification processes.

The differentially pumped analyser range is also complimented with our range of high pressure residual gas analyzers.

Vision 1000-B RGA: Residual Gas Analyzers for General Vacuum Diagnostics:

Simplicity & accuracy. The residual gas analyzers of choice for vacuum diagnostics, chamber pumpdown and baseline characteristics.

Vision 1000-P RGA: Residual Gas Analyzer for PVD:

Intelligent, hands-free residual gas analyzers for PVD applications. Automated GO/NO-GO status based on ppb level detection of contaminants. Field proven routines will alarm on, and suggest causes for, common residual gas problems in PVD processes.

Vision 1000-E RGA: Residual Gas Analyzers for Etch Processes:

Application specific residual gas analyzers for reactive ion etch, high density etch, plasma etch and microwave etching.

Vision 1000-C RGA: Residual Gas Analyzer for CVD Processes:

Accurate, precise residual gas analysis identification & tracking in chamber clean, passivation sequences and deposition steps for various CVD processes.