Semion Retarding Field Ion Flux & Energy Analyser for Plasma Diagnostics & Characterisation

For in-situ measurement of;

- ion energy distribution (IEDF)
- ion flux
- ion current
- electron flux
- electron energy distribution (EEDF)

The Semion™ RFEA System is a retarding field ion & electron flux/energy analyser for use on grounded, DC, or RF biased electrodes and in both pulsed (including HIPMS) and continuous wave plasmas. It does not require differential pumping and provides analysis of both Ion Energy Distribution and Flux over a wide range of conditions and with a resolution of <1eV.

The high energy tail of the electron energy distribution function (EEDF) is also measured and comparison with Langmuir probe measurements shows exceptional agreement in the energy region where both devices overlap. Additionally, for the specific case of a sinusoidal radio-frequency driving signal applied to the electrode, the analyser is capable of clearly resolving between ions with different mass.


SemionTM Applications:

The Semion™ System finds many applications in research and industry.
Beam quality can be monitored in sputtering systems, and bimodal ion energy distributions may be observed in RF biased systems.
Time resolved measurements for pulsed DC applications (e.g. HIPIMS) are effortless by synchronising the Semion™ acquisition system with the source generator.

icon Semion Ion Energy and Flux Analysis System Brochure

Semion Plasma Ion Energy Analyser System

 Download our latest Application Notes:

icon Time Resolved Ion Energy and Flux from Pulsed Plasmas

icon EEDF Tail Measurement with the Semion RFEA

You can also find more references to recently published work in our links section.


Example Data:

IED’s with 2 MHz RF bias at various potentials. Discharge pressure = 2mTorr:

 IED’S for various bias frequencies with fixed potential:

Ion Energy Distributions at RF ElectrodeTime Resolved Ion Energy Distributions


SemionTM
Probe Diameter 60mm
Holder Diameter 80mm to 450mm
Holder Thickness 5mm
MountingProbe mounted flush with holder
Flange Type
KF40/CF40/ To Order
Substrate Holder to Chamber Wall
300mm to 3m/ To Order
Ion Current 2mA DC Max
Ion Flux 0.1 to 20 mA/cm2
Time Resolution
10Hz to 500kHz
Ion Energy Range
0-150eV or 0-500eV
IEDF Resolution
+/- 1eV
Materials
Aluminium/To Order


Related Products: ALP Langmuir Probe, Octiv VI Probe, Custom Vacuum Systems

For additional information, to request a quotation, or for a live online demonstration please contact us

 
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